Ion Beam Assisted Deposition

Oxygen plasma etching of carbon nano-structures containing nitrogen

Materials Engineering / Field emission / Non crystalline solids / Nitrogen / Plasma Etching / Nickel / Non / Silicon Wafer / Room Temperature / Ion Beam / Raman Spectra / Ion Beam Assisted Deposition / Nickel / Non / Silicon Wafer / Room Temperature / Ion Beam / Raman Spectra / Ion Beam Assisted Deposition